Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
US7847916B2 · kind B2 · utility
9Cited by
7References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2005 |
| Grant date | Dec 7, 2010 |
| Priority date | — |
| Expiry date | Dec 20, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.