Patent · US Active

Hologram and method of manufacturing an optical element using a hologram

US7848031B2 · kind B2 · utility

9Cited by

14References

8Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jochen Hetzler · Aalen, DE
Susanne Beder · Aalen, DE
Heiko Feldmann · Aalen, DE

Key dates

Filing date	Jan 20, 2006
Grant date	Dec 7, 2010
Priority date	—
Expiry date	Aug 15, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/2441
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.