Contamination pinning for auger analysis
US7855362B1 · kind B1 · utility
2Cited by
7References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2007 |
| Grant date | Dec 21, 2010 |
| Priority date | — |
| Expiry date | Mar 14, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/2276
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Electron spectroscopy methods and apparatus are disclosed. A beam of primary electrons is applied to a measurement location on a surface of a sample. A pinning flux of electrons is applied to one or more pinning regions proximate the measurement location. The pinning flux is characterized by a location, size, shape, and electron flux configured such that contaminants preferentially migrate to the pinning region rather than the measurement location. Emissions from the surface resulting from interaction with the primary electrons and the surface of the sample at the measurement location are analyzed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.