Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7859735B2 · kind B2 · utility
1Cited by
23References
8Claims
0Family size
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Key dates
| Filing date | Jul 9, 2009 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Jul 9, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70941
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.