Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process
US7865865B2 · kind B2 · utility
5Cited by
7References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 14, 2007 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Feb 17, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of the target pattern; (c) determining if an edge of another feature is within the region of influence with respect to the vertex; and (d) splitting the another feature into two polygons if the edge of another feature is within the region of influence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.