Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7866330B2 · kind B2 · utility
5Cited by
43References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 11, 2008 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | May 5, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.