Patent · US Active

Integrated circuit with an active area line having at least one form-supporting element and corresponding method of making an integrated circuit

US7868415B2 · kind B2 · utility

1Cited by
0References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 23, 2008
Grant dateJan 11, 2011
Priority date
Expiry dateOct 30, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32139
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An integrated circuit is described. The integrated circuit may have: an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate; wherein the active area line has at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate; and wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.