Integrated circuit with an active area line having at least one form-supporting element and corresponding method of making an integrated circuit
US7868415B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2008 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | Oct 30, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated circuit is described. The integrated circuit may have: an active area line formed of a material of a semiconductor substrate with a first longitudinal direction parallel to an upper surface of the semiconductor substrate; wherein the active area line has at least one form-supporting element extending in a second longitudinal direction parallel to the upper surface of the semiconductor substrate; and wherein the second longitudinal direction is arranged with regard to the first longitudinal direction in an angle unequal to 0 degree and unequal to 180 degree.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.