Patent · US Active

Temperature control system and substrate processing apparatus

US7870751B2 · kind B2 · utility

1Cited by
8References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 9, 2006
Grant dateJan 18, 2011
Priority date
Expiry dateNov 9, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67109
  • WIPO fieldOther consumer goods
  • WIPO sectorOther fields

Abstract

A temperature control system and a substrate processing apparatus are provided. The temperature control system for controlling temperatures of one or more members of a substrate processing apparatus includes a circulation system for circulating a first coolant to pass through the inside of each of the members, a heat exchanger for performing heat exchange between the first coolant of the circulation system and a second coolant, and a chiller for supplying the second coolant to the heat exchanger, wherein the circulation system includes a branch line for each of the members passing through the inside thereof, the branch line for each of the members is provided with a heating member for heating the first coolant supplied thereto, and the heat exchanger is installed in a room where the substrate processing apparatus is installed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.