Ion beam guide tube
US7872247B2 · kind B2 · utility
1Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2007 |
| Grant date | Jan 18, 2011 |
| Priority date | — |
| Expiry date | Nov 15, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31705
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.