Advanced process control framework using two-dimensional image analysis
US7875851B1 · kind B1 · utility
7Cited by
20References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 2006 |
| Grant date | Jan 25, 2011 |
| Priority date | — |
| Expiry date | May 24, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The claimed subject matter provides a system and/or a method that facilitates utilizing a resolution enhancement for a circuit feature. A scanning electron microscope component (104, 204, 304, 404) can provide at least one two-dimensional image of the circuit feature. An image analysis engine (106, 206, 306, 406) can analyze the two-dimensional image. An advanced process control (APC) engine (108, 208, 308, 408) can generate at least one instruction for at least one of a feed forward control and a feedback control and a process component (102, 202, 302, 402) can utilize the at least one instruction to minimize an error.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.