Chris Haidinyak
9Patents
5h-index
8Co-inventors
48Inventor score
Filing activity: May 31, 2002 → Apr 30, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7207017B1 | Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results | Physics | 60 | Expired |
| US7194725B1 | System and method for design rule creation and selection | Emerging Cross-Sectional Technologies | 29 | Expired |
| US7313769B1 | Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin | Physics | 21 | Expired |
| US7269804B2 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Physics | 17 | Expired |
| US7875851B1 | Advanced process control framework using two-dimensional image analysis | Electricity | 7 | Active |
| US7657864B2 | System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques | Physics | 3 | Active |
| US6824937B1 | Method and system for determining optimum optical proximity corrections within a photolithography system | Physics | 2 | Expired |
| US7543256B1 | System and method for designing an integrated circuit device | Physics | 2 | Active |
| US6982136B1 | Method and system for determining optimum optical proximity corrections within a photolithography system | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.