Lithography system with illumination monitor
US7880863B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 22, 2008 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Nov 6, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic system including a light source configured to provide a light beam, a mask stage configured to hold a mask having a mask pattern, a wafer stage having a surface configured to hold a wafer having a plurality of dies, and an illumination monitor having a receiver disposed at the surface of the wafer stage and a polarimeter. A projection system is configured to shape and direct the light beam via the mask pattern to form an exposure beam and to individually expose each die with the exposure beam, and is configured to shape and direct the light beam to form a monitor beam and to expose the receiver with the monitor beam. The receiver is configured to communicate the monitor beam to the polarimeter which, based on the monitor beam, is configured to provide an illumination signal representative of properties of the light beam as it passes through the lithographic system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.