Vlad Temchenko
6Patents
1h-index
6Co-inventors
40Inventor score
Filing activity: May 14, 2007 → Feb 18, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10593678B1 | Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related semiconductor devices | Physics | 2 | Active |
| US8715910B2 | Method for exposing an area on a substrate to a beam and photolithographic system | Physics | 0 | Active |
| US7880863B2 | Lithography system with illumination monitor | Physics | 0 | Active |
| US10991700B2 | Methods of forming semiconductor devices using aspect ratio dependent etching effects, and related memory devices and electronic systems | Physics | 0 | Active |
| US7738160B2 | Optical components, illumination systems, and methods | Physics | 0 | Active |
| US7910265B2 | Reticle for use in a semiconductor lithographic system and method for modifying the same | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.