Patent · US Active

System and method for model-based sub-resolution assist feature generation

US7882480B2 · kind B2 · utility

21Cited by

5References

16Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Jun Ye · Palo Alto, US
Yu Cao · Saratoga, US
Hanying Feng · Fremont, US

Key dates

Filing date	Jun 4, 2007
Grant date	Feb 1, 2011
Priority date	—
Expiry date	Jul 2, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine tune already-placed SRAFs. In another embodiment the SRAF guidance map is used directly to place SRAFs in a mask layout.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.