Jun Ye
146Patents
34h-index
85Co-inventors
93Inventor score
Filing activity: Dec 17, 1998 → Dec 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7587704B2 | System and method for mask verification using an individual mask error model | Physics | 224 | Active |
| US7003758B2 | System and method for lithography simulation | Physics | 203 | Expired |
| US6807503B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 88 | Expired |
| US6828542B2 | System and method for lithography process monitoring and control | Physics | 86 | Expired |
| US6529621B1 | Mechanisms for making and inspecting reticles | Physics | 78 | Expired |
| US7703069B1 | Three-dimensional mask model for photolithography simulation | Physics | 75 | Active |
| US6803554B2 | System and method for lithography process monitoring and control | Physics | 73 | Expired |
| US8200468B2 | Methods and system for lithography process window simulation | Physics | 73 | Active |
| US6969837B2 | System and method for lithography process monitoring and control | Physics | 72 | Expired |
| US7053355B2 | System and method for lithography process monitoring and control | Electricity | 68 | Expired |
| US6884984B2 | System and method for lithography process monitoring and control | Physics | 67 | Expired |
| US7492619B2 | System and method for providing control for switch-mode power supply | Emerging Cross-Sectional Technologies | 63 | Active |
| US7120895B2 | System and method for lithography simulation | Physics | 62 | Expired |
| US6806456B1 | System and method for lithography process monitoring and control | Physics | 62 | Expired |
| US6820028B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 60 | Expired |
| US7099164B2 | Adaptive multi-level threshold system and method for power converter protection | Electricity | 58 | Expired |
| US6969864B2 | System and method for lithography process monitoring and control | Physics | 58 | Expired |
| US6906305B2 | System and method for aerial image sensing | Physics | 57 | Expired |
| US6959255B2 | Method and apparatus for monitoring integrated circuit fabrication | Electricity | 55 | Expired |
| US7111277B2 | System and method for lithography simulation | Physics | 55 | Expired |
| US7114145B2 | System and method for lithography simulation | Physics | 55 | Expired |
| US7117478B2 | System and method for lithography simulation | Physics | 54 | Expired |
| US7117477B2 | System and method for lithography simulation | Physics | 54 | Expired |
| US7853920B2 | Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing | Physics | 49 | Active |
| US7679938B2 | System and method for providing control for switch-mode power supply | Emerging Cross-Sectional Technologies | 45 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.