Semiconductor processing system and vaporizer
US7883076B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2006 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Dec 9, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A semiconductor processing system includes a gas supply system configured to supply water vapor into a process chamber that accommodates a target substrate. The gas supply system is provided with a gas generating apparatus for generating water vapor from purified water. The gas generating apparatus includes a first vaporizing section configured to spray the purified water along with a carrier gas and heat the purified water, so as to generate preparatory water vapor containing mist, and a second vaporizing section configured to vaporize mist contained in the preparatory water vapor, so as to generate process water vapor from the preparatory water vapor. In the second vaporizing section, a thin film having a mesh structure is disposed across a passage for the preparatory water vapor and configured to trap mist between the first vaporizing section and the process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.