Method for amending layout patterns
US7886254B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 27, 2008 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Feb 25, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.