Te-Hung Wu
11Patents
3h-index
19Co-inventors
53Inventor score
Filing activity: Nov 30, 2001 → Feb 22, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6536130B1 | Overlay mark for concurrently monitoring alignment accuracy, focus, leveling and astigmatism and method of application thereof | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8151221B2 | Method to compensate optical proximity correction | Emerging Cross-Sectional Technologies | 4 | Active |
| US7913196B2 | Method of verifying a layout pattern | Physics | 3 | Active |
| US7669153B2 | Method for correcting photomask pattern | Physics | 3 | Active |
| US8321820B2 | Method to compensate optical proximity correction | Emerging Cross-Sectional Technologies | 3 | Active |
| US8042069B2 | Method for selectively amending layout patterns | Emerging Cross-Sectional Technologies | 2 | Active |
| US8321822B2 | Method and computer-readable medium of optical proximity correction | Physics | 1 | Active |
| US7886254B2 | Method for amending layout patterns | Physics | 1 | Active |
| US7664614B2 | Method of inspecting photomask defect | Physics | 1 | Active |
| US8225237B2 | Method to determine process window | Physics | 0 | Active |
| US8166424B2 | Method for constructing OPC model | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.