Lithographic apparatus, lens interferometer and device manufacturing method
US7889315B2 · kind B2 · utility
3Cited by
1References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 13, 2006 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Oct 24, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70566
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection system that is configured to project at least a portion of the radiation beam as a projected radiation beam; and a lens interferometer for sensing a wavefront state of the projected radiation beam. The lens interferometer is provided with a polarizing element so as to be capable of sensing a polarisation state of the projected radiation beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.