Method for patterning a radiation beam, patterning device for patterning a radiation beam
US7889316B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2006 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Sep 14, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.