Lithographic apparatus and device manufacturing method
US7894040B2 · kind B2 · utility
2Cited by
21References
38Claims
0Family size
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Key dates
| Filing date | Oct 5, 2004 |
| Grant date | Feb 22, 2011 |
| Priority date | — |
| Expiry date | May 24, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.