Patent · US Active

MEMS device and method of making the same

US7898081B2 · kind B2 · utility

4Cited by
1References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 3, 2008
Grant dateMar 1, 2011
Priority date
Expiry dateMay 15, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49005
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A MEMS device includes a vent hole structure and a MEMS structure disposed on a same side of a substrate. The vent hole structure adjoins the MEMS structure with an etch stop structure therebetween. The MEMS structure includes a chamber, the vent hole structure includes a metal layer having at least a hole thereon as a vent hole to connect the chamber of the MEMS structure through the etch stop structure. Accordingly, the MEMS device has a lateral vent hole. Furthermore, as the vent hole structure and the MEMS structure are disposed on the same side of the substrate, the manufacturing process is convenient and timesaving.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.