Automatic dynamic baseline creation and adjustment
US7899627B2 · kind B2 · utility
2Cited by
3References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 28, 2006 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | Sep 28, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma processing system, a method for dynamically establishing a baseline is provided. The method includes processing a first substrate. The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline. The method moreover includes including the first signal data in a recalculation of the baseline if the first signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.