Offset partial ring seal in immersion lithographic system
US7903233B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 18, 2005 |
| Grant date | Mar 8, 2011 |
| Priority date | — |
| Expiry date | Mar 27, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the apparatus includes a table configured to support a substrate (16); a patterning element defining a pattern (12); a projection system configured to project the pattern onto the substrate (16), the projection system having a last optical element (22); a gap between the substrate and the last optical element; an immersion element configured to maintain immersion fluid in the gap; and a first seal (102) positioned between the projection system and the immersion element. The first seal (104) is configured to substantially prevent immersion fluid from exiting the space between the projection system and the immersion element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.