Method for measuring the position of a mark in a deflector system
US7912671B2 · kind B2 · utility
1Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2005 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | Aug 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern. The invention also relates to software implementing the method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.