Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same
US7914693B2 · kind B2 · utility
61Cited by
2References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 18, 2006 |
| Grant date | Mar 29, 2011 |
| Priority date | — |
| Expiry date | Dec 29, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp.The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.