Patent · US Active

Reactor surface passivation through chemical deactivation

US7914847B2 · kind B2 · utility

98Cited by
19References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 30, 2006
Grant dateMar 29, 2011
Priority date—
Expiry dateJan 20, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45525
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Protective layers are formed on a surface of an atomic layer deposition (ALD) or chemical vapor deposition (CVD) reactor. Parts defining a reaction space for an ALD or CVD reactor can be treated, in situ or ex situ, with chemicals that deactivate reactive sites on the reaction space surface(s). A pre-treatment step can maximize the available reactive sites prior to the treatment step. With reactive sites deactivated by adsorbed treatment reactant, during subsequent processing the reactant gases have reduced reactivity or deposition upon these treated surfaces. Accordingly, purge steps can be greatly shortened and a greater number of runs can be conducted between cleaning steps to remove built-up deposition on the reactor walls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.