Patent · US Active

Lithographic apparatus and contamination removal or prevention method

US7916269B2 · kind B2 · utility

3Cited by

13References

12Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Anthonius Martinus Cornelis Petrus De Jong · Pijnacker, NL
Hans Jansen · Eindhoven, NL
Martinus Hendrikus Antonius Leenders · Rhoon, NL
Antonius Johannus Van Der Net · Tilburg, NL
Peter Franciscus Wanten · Mierlo, NL
Jacques Cor Johan Van Der Donck · Alphen aan den Rijn, NL
Robert Douglas Watso · Delevan, US
Teunis Cornelis van den Dool · Voorburg, NL
Nadja Schuh · Eindhoven, NL
Jan Willem Cromwijk · Best, NL

Key dates

Filing date	Sep 27, 2007
Grant date	Mar 29, 2011
Priority date	—
Expiry date	Sep 27, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70341
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.