Analysis method and analysis apparatus
US7923680B2 · kind B2 · utility
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3References
12Claims
0Family size
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Key dates
| Filing date | Jun 21, 2007 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Feb 15, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/0463
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An analysis apparatus includes a first process part for removing a film formed on a substrate by irradiating the film with ultraviolet light, a second process part for providing a solution onto a surface of the substrate for dissolving an object being analyzed on the substrate, and a third process part for analyzing the object being analyzed in the solution that is used in the second step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.