Lithographic apparatus and device and device manufacturing method
US7924403B2 · kind B2 · utility
2Cited by
24References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2006 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Mar 17, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.