Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component
US7927066B2 · kind B2 · utility
4Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2006 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Jan 18, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/794
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.