Shosuke Endoh
8Patents
4h-index
21Co-inventors
53Inventor score
Filing activity: Sep 22, 1997 → Mar 14, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8124539B2 | Plasma processing apparatus, focus ring, and susceptor | Electricity | 7 | Active |
| US7622017B2 | Processing apparatus and gas discharge suppressing member | Electricity | 4 | Expired |
| US7927066B2 | Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component | Emerging Cross-Sectional Technologies | 4 | Active |
| US7850174B2 | Plasma processing apparatus and focus ring | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8114247B2 | Plasma processing apparatus and focus ring | Emerging Cross-Sectional Technologies | 4 | Active |
| US5961361A | Method for manufacturing electrode plate for plasma processing device | Electricity | 3 | Expired |
| US7604845B2 | Method for coating internal member having holes in vacuum processing apparatus and the internal member having holes coated by using the coating method | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8727708B2 | Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component | Emerging Cross-Sectional Technologies | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.