Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
US7927090B2 · kind B2 · utility
8Cited by
5References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 30, 2005 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Sep 5, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint lithography apparatus is disclosed, the apparatus including a substrate table arranged to support a substrate having a first surface to be imprinted and a second surface, facing the substrate table, comprising a substrate alignment mark, a template holder arranged to hold a template to imprint the first surface of the substrate, and an alignment system arranged to align the template to a substrate alignment mark provided on the substrate, wherein the substrate table further comprises a substrate table optical system to allow the substrate alignment mark to be viewed by the alignment system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.