Peter Ten Berge
22Patents
3h-index
48Co-inventors
59Inventor score
Filing activity: Dec 1, 2003 → Jun 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7927090B2 | Imprint lithographic apparatus, device manufacturing method and device manufactured thereby | Physics | 8 | Active |
| US9594029B2 | Methods and apparatus for measuring a property of a substrate | Emerging Cross-Sectional Technologies | 4 | Active |
| US10317191B2 | Methods and apparatus for measuring a property of a substrate | Emerging Cross-Sectional Technologies | 3 | Active |
| US11768441B2 | Method for controlling a manufacturing process and associated apparatuses | Electricity | 2 | Active |
| US8887107B2 | Inspection method and apparatus and lithographic processing cell | Physics | 2 | Active |
| US10746668B2 | Methods and apparatus for measuring a property of a substrate | Emerging Cross-Sectional Technologies | 2 | Active |
| US10816907B2 | Method for determining an optimized set of measurement locations for measurement of a parameter of a lithographic process, metrology system and computer program products for implementing such methods | Physics | 1 | Active |
| US11086229B2 | Method to predict yield of a device manufacturing process | Physics | 1 | Active |
| US10996176B2 | Methods and apparatus for measuring a property of a substrate | Emerging Cross-Sectional Technologies | 1 | Active |
| US7349071B2 | Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method | Physics | 1 | Active |
| US10996573B2 | Method and system for increasing accuracy of pattern positioning | Physics | 1 | Active |
| US7253077B2 | Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium | Emerging Cross-Sectional Technologies | 1 | Expired |
| USRE49460E1 | Inspection method and apparatus and lithographic processing cell | General | 0 | Active |
| US10691863B2 | Method and apparatus to correct for patterning process error | Physics | 0 | Active |
| US7342642B2 | Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method | Physics | 0 | Expired |
| USRE49199E1 | Inspection method and apparatus and lithographic processing cell | General | 0 | Active |
| US10719011B2 | Method and apparatus to correct for patterning process error | Physics | 0 | Active |
| US11977034B2 | Methods and apparatus for measuring a property of a substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US11170072B2 | Method and apparatus for inspection and metrology | Electricity | 0 | Active |
| US11714357B2 | Method to predict yield of a device manufacturing process | Physics | 0 | Active |
| US10915689B2 | Method and apparatus to correct for patterning process error | Physics | 0 | Active |
| US11036146B2 | Method and apparatus to reduce effects of nonlinear behavior | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.