Patent · US Active

Polarized radiation in lithographic apparatus and device manufacturing method

US7929116B2 · kind B2 · utility

0Cited by

9References

24Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Christian Wagner · Rosenheim, DE
Wilhelmus Petrus De Boeij · Veldhoven, NL
Tilmann Heil · Aalen, DE
Damian Fiolka · Oberkochen, DE
Roel De Jonge · Veldhoven, NL

Key dates

Filing date	Jan 30, 2008
Grant date	Apr 19, 2011
Priority date	—
Expiry date	Jul 25, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7065
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.