Lithographic apparatus and device manufacturing method
US7932999B2 · kind B2 · utility
19Cited by
31References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2006 |
| Grant date | Apr 26, 2011 |
| Priority date | — |
| Expiry date | Apr 6, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.