Measuring in-situ UV intensity in UV cure tool
US7935940B1 · kind B1 · utility
542Cited by
19References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 8, 2008 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Jan 23, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Consistent ultraviolet (UV) intensity for a semiconductor UV cure chamber is measured in-situ with a hot pedestal in vacuum by measuring reflected UV light from a calibration substrate at a UV detector mounted in the lamp assembly. The measurement apparatus includes a UV detector, a cover that protects the detector from UV light while not in use, and a mirror disposed between the chamber window and the UV detector. Measured UV intensity from the substrate reflection and from the mirror reflection help determine a course of maintenance action to maintain wafer-to-wafer uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.