Substrate cleaning chamber and components
US7942969B2 · kind B2 · utility
466Cited by
317References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2007 |
| Grant date | May 17, 2011 |
| Priority date | — |
| Expiry date | Feb 11, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas inlet channel of a substrate cleaning chamber. The substrate heating pedestal comprises an annular plate having a substrate receiving surface with a plurality of ceramic balls positioned in an array of recesses. A process kit comprises a top plate, top liner, gas distributor plate, bottom liner, and focus ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.