Patent · US Active

Apparatus and method for removing bubbles from a process liquid

US7947158B2 · kind B2 · utility

1Cited by
15References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 25, 2009
Grant dateMay 24, 2011
Priority date
Expiry dateSep 25, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/2885
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention is directed to methods and apparatuses for removing bubbles from a process liquid. The process liquid can comprise a plating solution used in a plating tool. The process liquid is supplied to a tank. A plurality of streams of the process liquid are directed towards a surface of the process liquid from below. This can be done by feeding the process liquid to a flow distributor comprising a plurality of openings providing flow communication between an inner volume of the flow distributor and a main volume of the tank. Before leaving the tank through an outlet, the process liquid flows through a flow barrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.