Method of fabricating a mixed microtechnology structure and a structure obtained thereby

US7947564B2 · kind B2 · utility

Assignee

• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Marek Kostrzewa · Grenoble, FR
• Hubert Moriceau · Saint-Égrève, FR
• Marc Zussy · Grenoble, FR

Key dates

• Filing date: Sep 18, 2007
• Grant date: May 24, 2011
• Expiry date: Apr 10, 2028

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C1/00357
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of fabricating a mixed microtechnology structure includes providing a provisional substrate including a sacrificial layer on which is formed a mixed layer including at least first patterns of a first material and second patterns of a second material different from the first material, where the first and second patterns reside adjacent the sacrificial layer. The sacrificial layer is removed exposing a mixed surface of the mixed layer, the mixed surface including portions of the first patterns and portions of the second patterns. A continuous is formed covering layer of a third material on the mixed surface by direct bonding.