Patent · US Active

Scribe process monitoring methodology

US7956337B2 · kind B2 · utility

1Cited by
13References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 9, 2008
Grant dateJun 7, 2011
Priority date
Expiry dateJul 4, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/50
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

One embodiment of the present invention sets forth a computer-implemented method for tuning laser scribe parameters during the fabrication of a solar module. The method includes analyzing the visual appearance of a laser scribe to extract various morphological parameters related to the quality of a laser scribe process used to produce the scribe. Based on the morphological parameters, the laser scribe parameters may be modified in-situ to achieve settings that are optimal for performing laser scribing in each layer of the solar module. As a result, laser scribe process cycle time may be minimized while providing better indication of the laser scribe process stability and quality relative to the prior art approaches.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.