Patent · US Active

Sub-resolution assist devices and methods

US7961292B2 · kind B2 · utility

2Cited by

2References

44Claims

0Family size

Assignee

Micron Technology, Inc. · US

Inventors

Anton P. Eppich · Boise, US
Fei Wang · Beijing, CN

Key dates

Filing date	May 7, 2007
Grant date	Jun 14, 2011
Priority date	—
Expiry date	Apr 15, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70433
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive phase adjustment region interposed between the first optical attenuation region and the second optical attenuation region, the phase adjustment region being configured to change a phase of incident illumination radiation by altering an optical property of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.