Lithographic apparatus and device manufacturing method
US7961293B2 · kind B2 · utility
3Cited by
24References
25Claims
0Family size
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Key dates
| Filing date | Mar 17, 2008 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | Apr 7, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.