Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
US7961309B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 5, 2009 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | Aug 5, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.