Cleaning of plasma chamber walls using noble gas cleaning step

US7964039B2 · kind B2 · utility

Assignees

• IMEC · BE
• Katholieke Universiteit Leuven, KU LEUVEN R&D · BE

Inventors

• Adam Michal Urbanowicz · Wrocław, PL
• Mikhail Baklanov · Veltem-Beisem, BE
• Denis Shamiryan · Heverlee, BE
• Stefan De Gendt · Wijnegem, BE

Key dates

• Filing date: Sep 5, 2008
• Grant date: Jun 21, 2011
• Expiry date: Jul 21, 2029

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B08B7/0057
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An improved reaction chamber cleaning process is provided for removing water residues that makes use of noble-gas plasma reactions. The method is easy applicable and may be combined with standard cleaning procedure. A noble-gas plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules to form electronically excited oxygen atoms is used to remove the adsorbed water.