Multi-layer/multi-input/multi-output (MLMIMO) models and method for using
US7967995B2 · kind B2 · utility
15Cited by
1References
19Claims
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Key dates
| Filing date | Mar 31, 2008 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | Apr 15, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.