Inductively-coupled plasma source
US7969096B2 · kind B2 · utility
52Cited by
40References
59Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 15, 2006 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | Apr 5, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.