Spectrographic metrology of patterned wafers
US7969568B2 · kind B2 · utility
2Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2009 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | Jan 18, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.