Patent · US Active

Systems and methods for determining width/space limits for a mask layout

US7970485B2 · kind B2 · utility

1Cited by
4References
9Claims
0Family size

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Inventor

Key dates

Filing dateMay 20, 2009
Grant dateJun 28, 2011
Priority date—
Expiry dateSep 26, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/84
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.