Vapor dryer having hydrophilic end effector
US7980000B2 · kind B2 · utility
7Cited by
60References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2008 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Mar 13, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.